Structure and properties NbN and Nb-Si-N deposited by magnetron sputtering
NbN and Nb-Si-N films were deposited by magnetron sputtering the Nb and Si targets on silicon wafers at various bias voltage. The films were annealed to establish their stability. The films were nanostructured represented an aggregation of crystallites.
| Рубрика | Производство и технологии |
| Вид | статья |
| Язык | английский |
| Дата добавления | 30.07.2016 |
| Размер файла | 838,0 K |
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